Kurita Water Industries has been granted a patent for a dilute chemical solution supply device designed for wafer washing. The device includes a preparation unit, reservoir, supply mechanism, and return system, enabling precise concentration adjustment and minimizing excess water discharge. GlobalData’s report on Kurita Water Industries gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Kurita Water Industries, Reverse osmosis and nano-filtration was a key innovation area identified from patents. Kurita Water Industries's grant share as of July 2024 was 41%. Grant share is based on the ratio of number of grants to total number of patents.
Dilute chemical solution supply device for wafer washing
The patent US12030024B2 describes a dilute chemical solution supply device designed for the efficient production and distribution of dilute chemical solutions. The device includes a production unit that integrates an ultrapure water source, multiple chemical solution tanks, and pumps to create a dilute solution with a specified concentration. It features a reservoir for storing the produced solution, a supply mechanism with a pump and flow path for delivering the solution to a designated use point, and a return mechanism that includes a return pipe for excess solution, along with a concentration monitor to ensure the desired chemical concentration is maintained. Additionally, the reservoir is equipped with a discharge flow path that connects back to the production unit, enhancing the system's efficiency.
Further enhancements to the device include options for gas dissolution, where a gas dissolution means can be integrated to infuse a specific gas into the dilute solution. The design also allows for the use of closed tanks for chemical storage, with provisions for inert gas supply to maintain solution integrity. The system incorporates a level sensor to monitor reservoir water levels, enabling automated control of solution production. Moreover, the device can feature multiple reservoirs operating in parallel, with switching valves to manage flow from each reservoir, thereby increasing flexibility and reliability in solution supply. The inclusion of an ion-exchange resin column on the discharge flow path further ensures the quality of the produced dilute chemical solution.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
